I am so excited to be taking part in the Extreme Ultraviolet Science and Technology – an Engineering Research Center (ERC) program this summer (2015) in Boulder. I will be learning from world-class researchers who are exploring the development of compact coherent extreme ultraviolet (EUV) sources and their applications in challenging scientific and technological problems.
According to the site for the program, "Light in the extreme ultraviolet region of the electromagnetic spectrum covers the 5-50 nm range. Because its wavelength is 100-10 times shorter than visible light it can ‘see’ and ‘write’ smaller patterns in applications such as microscopy and lithography. Furthermore, these wavelengths are well matched to the primary atomic resonances of most elements, making possible many element- and chemically- specific spectroscopies and spectromicroscopies."
You can learn more about the program by clicking on this EUV ERC link! I will be blogging about my experience beginning in June 2015!
According to the site for the program, "Light in the extreme ultraviolet region of the electromagnetic spectrum covers the 5-50 nm range. Because its wavelength is 100-10 times shorter than visible light it can ‘see’ and ‘write’ smaller patterns in applications such as microscopy and lithography. Furthermore, these wavelengths are well matched to the primary atomic resonances of most elements, making possible many element- and chemically- specific spectroscopies and spectromicroscopies."
You can learn more about the program by clicking on this EUV ERC link! I will be blogging about my experience beginning in June 2015!